OMNI Dri-Train - Inert Gas Purification System

General Description: Single column inert gas purifier system mounted into low profile cabinet. The cabinet will install below the glove box antechamber, below the glove box or remotely. The system includes the OMNI PLC Control System with touch screen LED display. The PLC touch screen panel is angled upward for readability. The system can achieve less than 1-PPM oxygen and moisture equilibrium with a typical VAC glove box. The system will also control glove box pressure.

Purification Capacity: 20 liters of O2 and 2.3 Kg of H2O absorption capacity (per catalyst mfg. specs.)

Control System: Mitsubishi touch screen PLC monitors and controls the OMNI system via an easy to use menu driven interface with a simple graphical display. Built in programmed control of purifier regeneration, glove box pressure and purging. Built in system diagnostics.

Technical Bulletin

Nexus Modular

The Nexus modular Purification System can be configured to provide flow rates of 40 CFM, 80 CFM, 120 CFM and 160 CFM. The small size of the module makes this system the ideal choice for any installation. The purifier is configured with a variable speed blower and automatic circulation valves. The Nexus Modular can achieve less than 1-PPM oxygen and moisture equilibrium. The system will also control antechamber evacuation/refill, glovebox pressure and purge.

The 10.4 ‘’ touch screen LCD displays glovebox pressure, blower speed, analyzer levels (with appropriate sensors) and system status; the operator may note Antechamber operation and regeneration status at a glance. An alarm panel shows any out of tolerance condition for operator acknowledgement or correction. There is also a 5.7’’ display available with a slightly different screen layout. The system interfaces to VAC Oxygen and/or Moisture Analyzer Assemblies.

Technical Bulletin

Ni-Train(Nitrogen & Hydrogen Removal>

• 20 CFM Single Retort System, (left) • 40 CFM Dual Retort System with blower (right) •Nitrogen removal to <1 PPM • Hydrogen removal to <20 PPM